Conte Nanotechnology Cleanroom Lab

For more information: http://nano.pse.umass.edu/
1,400 sq. ft. Class 1000 clean room (Conte B-132)

Metallization

• E-beam evaporation
• Sputtering

Deposition and Etch

• Deposition of Si, SiO2, Si3N4, amorphous Si
• Etching of Si and derivatives, resists, IT, etc.

Lithography

• DUV Flood Exposure system
• Suss Microtec MA6 mask aligner
• E-beam writing

Wet Chemistry

• Acid etch
• Solvent rinse
• Wafer cleaning
• Electroplating

Metrology

• Optical microscopy
• Ellipsometry
• Profilometry
• Wafer probing